タイトルまたは説明

High vacuum lab CVD tube furnace
 
High vacuum lab CVD tube furnace application
 
High vacuum lab CVD tube furnace apply chemical vapor deposition technique, adopting oil-free vacuum system, and high limit vacuum degree. The growth room of quartz tube is very clean and pollution-free; multi-gas control is controlled reasonable; with high heating temperature which is accuracy and uniformity; with system protection function; can prepare high purity conductor film such as photo electronics, microwave devices, etc. This equipment is suitable for laboratories, institutions of higher learning laboratory, scientific research and pilot plant test.
 
High vacuum lab CVD tube furnace features
 
1.Enclosed tube furnace
2.A wide range of pressure from standard atmosphere to low pressure *0 Pa
3.Quick and professional technical support
4.Three-channel gas quality controller
5.Excellent temperature uniformity