タイトルまたは説明

China Rare Metal Material Co., Ltd produce kinds of sputtering targets for flat panel display as below: Alumina doped Zinc Oxide sputtering targets (AZO), Tin doped indium Oxide sputtering target (ITO) Niobium Oxide sputtering target(Nb2O5, NbOx) Magnesium fluoride sputtering target (MgF2) Molybdenum Niobium sputtering target (MoNb), Mo(*0)Nb(*0)wt% Antimony dopedTin Oxide sputtering target ,ATO(Sb2O3:SnO2) Silicon sputtering target (Si) Silicon Aluminum sputtering target (SiAl) Titanium Oxide sputtering target (TiOx, TiO2, TiO ) Niobium doped Titanium Oxide sputtering target (TiOxNb) biggest size: Disc *8 inch（**7.2mm) diameter Rectangle :**0mmx**5mm or **0mmx**0mm or **0mmx**0mm or **0x**0mm Relative Density: *9%min produce way: hot pressing Production Capacity: about ***0kg per month