离岸价格
Get Latest Price|
1 Piece Minimum Order
国:
China
モデル番号:
GK2
离岸价格:
ロケーション:
China
最低注文量の価格:
-
最低注文量:
1 Piece
パッケージの詳細:
200kg
納期:
2 months
供給能力:
1 Piece per Month
支払いタイプ:
PayPal, Western Union, T/T
製品グループ :
連絡先担当者 Ms. Karen
Liulitun, Chaoyang District, Beijing, Beijing
Lithography
GK2
GK2 lithography is used in the LSI, sensor, surface wave component,
magnetic bubble, microwave, CCD and so on.
Need more information about GK2 lithography, contact with us.
Lithography GK2 Technical parameter：
| Item |
Parameter |
|
The size |
a.**0X**0X2ï¼3mmï¼›b.*5X*5X2—3mmï¼›c.*3X*3X2—3(can choose)ï¼› |
|
Silicon size |
φ*5—*5mm |
|
The line |
**4μm, The thinnest can be 2μm |
|
Mask and silicon displacement range |
X/Y±2.5mm,(rotation) ±6° |
|
Worktable rotate around the principal axis |
Coarse adjustment **0° can be fine adjusted. |
|
Worktable moving range |
X,Y compose φ*5mm |
|
The? worktable’s tee surface to the moulding board |
0—7.5mm |
|
Exposal light |
GCQ**0W over high pressure HG light，Exposal wave length，**0―**6nm |
|
Exposal system should be above? |
7mw |
|
Exposal system uniformity of illuminance range should be in φ*5mm |
±5ï¼… |
|
Microscopical lighting wave length |
≈**5nm |
|
Time of exposure control range |
0.1 sec—*9 min |
|
Amplification of the binocular microscope |
a. Two kinds ocular:*0X,*6Xï¼›b. Three kind plan objective :6X,9X,*5Xï¼›c.Composed magnification ratio.:*0X—**0Xï¼› |
|
Vacuum contact pressure |
≥0.7kgf |
|
Dimension |
***0X**0X**0mm(two pcs) |
|
Weight |
**0kg |
| 国: | China |
| モデル番号: | GK2 |
| 离岸价格: | Get Latest Price |
| ロケーション: | China |
| 最低注文量の価格: | - |
| 最低注文量: | 1 Piece |
| パッケージの詳細: | 200kg |
| 納期: | 2 months |
| 供給能力: | 1 Piece per Month |
| 支払いタイプ: | PayPal, Western Union, T/T |
| 製品グループ : | lithography machine |
