MEW RPS MKS ASTEX

タイトルまたは説明

Remote plasma source, also known as remote high-density plasma generator, is the core equipment in semiconductor and chip manufacturing processes. It uses ionized fluorine to clean the silicon dust deposited inside the chip structure. In semiconductor and chip manufacturing processes, with time increasing, a large amount of silicon dust will be deposited inside and on the surface of the chip. Remote plasma source can provide a large amount of ionized fluorine to corrode various structures under vacuum conditions Carve clear selection. Due to the remote plasma cleaning method, which indirectly generates plasma while separating the plasma generator from the chip process chamber, it can achieve rapid cleaning without damaging the cavity, i.e. achieving! Ion process.