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国:
China
モデル番号:
CJ-800
离岸价格:
ロケーション:
-
最低注文量の価格:
-
最低注文量:
1
パッケージの詳細:
standard wooden case
納期:
within 2 weeks after got your payment
供給能力:
5 per Week
支払いタイプ:
T/T
製品グループ :
連絡先担当者 sherry
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Operational principle:
CJ series magnetron sputtering vacuum membrane plate machine: the
principle of sputtering is to use the energetic particle
(normally we used the gas positive ion) to bombard the object so
as to make the surface atom of the object escape from it. As far
back as ***2, Grove had found this phenomenon in the
laboratory.
The magnetron sputtering target adopts the static electromagnetic
field, which is curvilinear, while the plane target and
cylindrical target adopt the uniform electric field and logarithm
electric field respectively.
Under the effect of the electric field, the electron will collide
with the argon atom in the process of accelerating flying to the
substrate. When the electron has enough energy (about *0ev), Ar+
will be ionized and the electron will be produced and flying to
the substrate; Likewise, Ar+ will accelerate to fly to the
cathode (the sputtering target) and bombard the surface of the
target with high energy and make the target sputtering under the
effect of the electric field.
Applications:
Its widely used in electrical appliances, watch & clock, golf
head, arts and crafts, toys, lights reflectors, phone keypad
housing and instrument, plastic, glass, ceramic, tile and other
surface decorative coating film and functional coating of tool
and mould. It has the irreplaceable advantages in areas of
ultra-black film, gold decoration film and conductive film.
Features:
1) Good film thickness controllability and repeatability. It can
obtaint the detained thickness of film reliably. Its easy to
obtain uniform thickness film layer on the large surface
substrate by using sputtering coating technology.
2) Strong adhesion of the film and the substrate. Some of the
high energy of the sputtered atoms generates the different
degrees of incidence phenomenon, forming a layer of
pseudo-diffusion layer that sputtered atoms fused to the
substrate atoms each other;
3) Different materials can be used to sputter to make mixed film
and compound film, and a Tin imitation gold film also can be
sputtered;
4) High purity with film layer, the sputtering film layer will
not be mixed with components of crucible heater material.
5) It is equipped with a low-temperature auxiliary ion beam
source, it can coat the film directly at room temperature without
heating, energy saving and productivity improvement.
Model | CJ***0 |
vacuum chamber dimensions | φ **0 X***0MM |
vacuum system |
KT**0 Diffusion pump unit |
Coating system | Dc or intermediate frequency power supply, plating auxiliary ion dedicated power supply |
Inflation system | Mass flowmeter |
Control mode | Manual or automatic |
Ultimate vacuum | 5X***4Pa |
Remarks | Above equipment parameters for your reference only, For specific details, it will be according to customers' requirement of practical process design and choice. |
国: | China |
モデル番号: | CJ-800 |
离岸价格: | Get Latest Price |
ロケーション: | - |
最低注文量の価格: | - |
最低注文量: | 1 |
パッケージの詳細: | standard wooden case |
納期: | within 2 weeks after got your payment |
供給能力: | 5 per Week |
支払いタイプ: | T/T |
製品グループ : | magnetron sputtering coating machine |