Tantalum Sputter Target ( Ta Sputter Target )

タイトルまたは説明

Specifications of Tantalum Sputter Targets ( Ta Sputter Target )
* Standard: ASTM B**4
* Purity: *9.*5% or *9.**9%
* Target Shapes: plate, square, circle , wafer, rectangular, tube, step wafer, step rectangle, and customization.
* Size: Circle Shape: Thickness >1mm ,  Diameter <*4inch
           Block Shape: Thickness >1mm , Length <*2inch, Width <*2inch
* Materials:
        RO***0
        (unalloyed tantalum, electron-beam furnace or vacuum-arc melt)
        RO***0
        (unalloyed tantalum, powder-metallurgy consolidation)
* Features:Corrosion resistance
                Long service life
                Workability           
* Applications ：Electronics & Semiconductor
                        Displays
                        Magnetic Data Storage

Shanghai Materials provides tantalum sputtering targets which widely used in displays , electronics and semiconductor etc. We ensure our Ta sputter targets in high quality and competitive price.