Al/Cr alloy target (70:30,50:50at%)

タイトルまたは説明

CENTRE METALLURGY TECH LTD specializes in manufacturing a wide range of high quality sputtering targets ,which are extensively used in the industries of architectural & auto glass, optics, solar photovoltaic, flat panel display, decoration, electronics, semiconductor and etc.
The sputtering targets we are manufacturing show outstanding performance by virtue of high density, excellent purity, and distinguished homogeneous microstructure.
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,
 
2.Typical alloy target :
1) Ti/Al alloy target (*7:*3,*0:*0at%)
2) W/Ti alloy target (*0:*0wt%),
3) Ni/V alloy target (*3:7,wt%)
4) Ni/Cr alloy target  (*0:*0, *0:*0,wt%),
5) Al/Cr alloy  target (*0:*0,*0:*0at%)
6) Nb/Zr alloy  target (*7:3,*0:*0wt%
7) Si/Al alloy target (*0:*0,*5:5,*8:2,*0:*0,wt%)
8) Zn/Al alloy
9)Pure Cr  target (*9.*5%, *9.**5%)
*0)Al/Cr alloy target (*0:*0, *0:*0at%)
*1) Ni/Cu alloy target (*0:*0,*0:*0,wt%)
*2)Al/Nd alloy target (*8:2wt%)
*3)Mo/Nb alloy target (*0:*0,wt%)
*4)TiAlSi  alloy target (Ti/Al/Si=*0/*0/*0, *3/*7, *0/*0/*0 ,wt% and at%)
*5)CrAlSi  alloy target (Cr/Al/Si=*0/*0/*0 ,wt% and at%)and so on, and help set of target material