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CHEMAT TECHNOLOGY, INC. has designed and manufactured a compact and easy-to-use hotplate, Model KW*4AH, for baking and curing thin films and coatings. Its rugged, portable design, and temperature uniformity make it a versatile tool for research facilities. In conjunction with KW*4A spin coater, KW*4AH hotplate can be used to fabricate metal oxide thin films, polymer coatings and metal organic thin films. Specifications Options: Operation: Manual Load Process Control: Program Temperature Resolution: 1oC Temperature Range: *****0oC Substrate Size: 6 inch - **0oC Max. Temp - 0.1oC Resolution - Inert Gas Purge
