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連絡先担当者 Ms. amy
398 RuoShui Road Industrial Park, suzhou, jiangsu
1ï&frac*4;‰Applied in semiconductor wafer’s cleaning and etching;　 　　 2ï&frac*4;‰Standard etching process, use HF/HNO3, KOH, NaOH, H3PO4, BOE, DHF, SPM, SOM and etc. 3ï&frac*4;‰Control mode: Manual, semi-auto, Auto.; 4ï&frac*4;‰Material:Depending on process and customer requirement, available matierials eg.PP, PVC, PVDF, Quartz Tube, Stainless steel and others; Features and benefits: ï¬ A. Module design;Depending on customer requriment and process, offer special solution; B. Customization based on customer budget; C. Optimum wet cleaning solution; D. High PPR; E.Various options available:; F. Operator friendly and safe; G. Easy maintenance; Non-standard product, please contact for special process solution with your requirement! For more product infos, please download: CSE Semiconductor Product Catalogue
