Description
Magnetron
sputtering target
(CNM could provide high quality target material for the field
of electrical and semiconductor devices, flat panel display ,
architectural and automotive glass, thin film solar cell, magnetic
storage, instrument, decorate thin film, etc.）
High purity metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im, Ag, Sn, graphite,
Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt
Target
High density ceramic sputtering target: ITO target, AZO
target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS,
CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2,
WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3,
BaTiO3, LaTiO3, PrTiO3 target, etc.
Note: The ceramic target produced
in CNM adopts the most advanced ceramic production technology-inert
gas protection hot isostatic pressing sintering technology, the
relative density is grater than ****9%. In addition, CNM could
provide with the metalizing process of the target and unbounded
services.
High purity alloy sputtering
target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al
Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga
Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target,
Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target,
etc
Note: CNM product high purity
Alloy sputtering target: tiny grain size number (*****0um), high
relative density (****9.9%), high purity
(*9.***9.**9%).
In addition, CNM provides with the metalizing process of
the target materials and unbounded services.
Vacuum
coating material
(For
complex film, color film, anti-reflection film, ultraviolet
coating, air-sensitive sensor coating, high temperature dielectric
coating, optical film, laser aid filter, preservative, transparent
conducting film,discolor film, good wide band
anti-reflection film,ferromagnetic film, visible region
anti-reflection, infrared anti-reflection film,
spectro-film,multilayer film, high reflectance
coating,resistive film, high temperature
reflectance coating, cold light
coating.
High quality vacuum coating
material:(4N*5N)
1. Oxide:
SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc.
high purity Oxide coating materials.
2. fluoride:
NbF3, BaF2, CeF3, MgF2, LaF3, YF3, YbF3, ErF3 etc. high purity
Fluoride.
3. other
compound: ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3,
PrTiO3,CdS etc. vacuum coating materials.
4. metal
coating material: high purity Al, Cu, Ti, Si, Au, Ag, Im,
Mg, Zn, Pt, Ge, Ni, Au-Ge Alloy, Au-Ni Alloy, Ni-Cr Alloy, Ti-Al
Alloy, Cu-Im-Ga Alloy, Ci-Im-Ga-Se Alloy, Zn-Al Alloy, etc. Metal
coating materials.
Note: the vacuum coating
materials produced by CNM boasts the following advantages: high
purity, no spilling, low deflation, well-distributed film, strong
adhesion, better resistance to corrosion, uniform color, and so
on.
