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Sell Compact Magnetron Sputter System

Sell Compact Magnetron Sputter System

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( Negotiable )

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Minimum Order

Place of Origin:

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Price for Minimum Order:

-

Minimum Order Quantity:

1 Set

Packaging Detail:

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Delivery Time:

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Supplying Ability:

-

Payment Type:

L/C

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A-Tech System

South Korea

無料会員

連絡先担当者 Mr. Yoon

175-25 Cheongcheon-Dong 2, Bupyeong-Gu, Incheon, Incheon

今すぐお問い合わせください

Description

Applicable to various R&D fields that sputter deposition of metals and ceramic materials is necessary.
Application areas: semiconductor, display, solar cell, biochips, new materials, nanomaterials, and sample preparations, etc.

Special Features

RF or DC magnetron sputter for multipurpose R&D.
RF to DC power supply easily changed without hardware change.
Deposition available for various materials of metals, carbon materials, metal oxides and metal nitrides, etc.
Small space needed for installation.
Efficient deposition through easy operation.
High performance to low cost.
Target shutter, view port shutter and chamber liners installed.
Ar gas introduced between cathode shield and target for high sputter yield.
Reactive sputtering also available.

Specifications

Target size: 2in to 3in
System control: PLC-based touch panel
Substrate holder size: normally up to 3in wafer
Substrate heating: basically not heated or water-cooled (optionally heated up to **0oC)
Bias plasma applied to substrate holder (optional)
Target to substrate distance: *0 to **0mm controllable
Sputter power supply: **0W RF power supply(*3.*6MHz) with matching circuit (DC power optional)
Process gas: Ar, O2 (N2 optional)
Vacuum gauge: low and high vacuum gauges
Base pressure: <5.0E*6Torr <br /> Pumping system of TMP (*1 l/s)+rotary oil pump(**0 l/min) (dry pump is optionally available)
Water: <*0oC, 2kg/cm2, *0l/min <br /> Compressed air: 5kg/cm2
Weight: **0kg
Dimension: **1mm(W) x **8mm(D) x **9mm(H)

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Mr. Yoon < A-Tech System >

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