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|Minimum Order
Place of Origin:
China guangdong
Price for Minimum Order:
-
Minimum Order Quantity:
1 Set
Packaging Detail:
20 GP Container
Delivery Time:
50 days after payment
Supplying Ability:
260 Set per Year
Payment Type:
L/C, T/T
連絡先担当者 Ms. li
The 4th industry zone,Yanwu village,Dalingshan Town,Dongguan,Guangdong,China, Dongguan, Guangdong
Characteristic: 1. The principle of magnetron sputtering is based on the cathode glow discharge theory, expanding the cathode surface magnetic field close to the surface of workpiece, to increased the ionized rate of sputtering atoms. It retains the delicate of the magnetron sputtering and increased the glossiness.
2.The performance of electric arc plasma evaporation source is reliable, be able to work under the current *0A when optimize the cathode and magnetic field structure coating, and the coating film and substrate interface produce atomic diffusion, plus the feature of the ion beam assisted deposition.
