タイトルまたは説明
Deposited by magnetron or other sputtering techniques, Indium Tin
Oxide (ITO) target is used for the ITO coated substrates including
electrodes for flat panel displays, touch panel contacts, energy
saving automobile and building window glass, optoelectronic
devices, solar panels, etc. 1.) Metal sputtering target: Silver,
Ag, Osmium, Os, Platinum, Pt, Palladium, Pd, Iridium, Ir,
Ruthenium, Ru, Rhenium, Re, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho,
Er, Tm, Yb, Lu, Sc, Y, Silicon, Si, Tellurium, Te, Bismuth, Bi,
Tin, Sn, Zinc, Zn, Sulphur, S, Graphite, C, Boron, B, Lead, Pb,
Antimony, Sb, Selenium, Se, Chromium, Cr, Cobalt, Co, Aluminum, Al,
Nickel, Ni, Titanium, Ti, Tungsten, W, Molybdenum, Mo, Tantalum,
Ta, Niobium, Nb, Zirconium, Zr, Hafnium, Hf, Vanadium, V,
Germanium, Ge, Indium In, Copper, Cu, Iron, Fe, Manganese, Mn, ,
Magnesium, Mg, Barium, Ba, Cadmium, Cd, Calcium, Ca, Strontium, Sr.
2.) Oxide sputtering target: La2O3, CeO2, Nd2O3, Sm2O3, Eu2O3,
Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, Sc2O3,
Y2O3, Ta2O5, Nb2O5, Ga2O3, V2O5, ZrO2 doped with Ti, WO3, HfO2,
MgO, Al2O3, Indium Tin Oxide, ITO (In2O*-SnO2), ZnO, Al2O3 doped
ZnO (AZO), Ga2O3 doped ZnO (GZO), La0.*7Sr0.*3MnO3 (LSMO),
ZrO*-Y2O3 stabilized (YSZ), ZrO2+Ti, ZrO2+SiO2, Bi2O3, Cr2O3, MoO,
MoO3, NiO, SiO, Cr-SiO, SiO2, TiO, TiO2, TiO*-Nb2O5, Ti2O3, Ti3O5,
CuO/Al2O3, Sb2O3, BaO, BaTiO3, CaO, Fe2O3, Fe3O4, PbO, PbTiO3,
PbZrO3, LiNbO3, SrO, SrTiO3, SrZrO3, SrBaTiO3, PZT (Plumbum
Zirconate Titanate), SrRuO3, LaNiO3, InGaZnO, CuInO2. 3.) (Boride,
Carbide, Nitride, Fluoride, Silicide, Sulfide) sputtering target
LaB6, ZrB2, CrB2, TiB2, HfB2, Mo2B5, TaB2, NbB2, W2B, WB, VB2 TiC,
SiC, WC, WC-Co, B4C, TaC, ZrC, Cr3C2, HfC, Mo2C, VC LaN, CeN, PrN,
NdN, SmN, EuN, GdN, TbN, DyN, HoN, ErN, TmN, YbN, LuN, ScN, YN,
Si3N4, AlN, BN, BN/SiC mixture, HfN, TaN, NbN, ZrN, TiN, VN LaF3,
CeF3, NdF3, YF3, NaF, KF, BaF2, AlF3, LiF, CaF2, SrF3, SrF2, MgF2
CoSi2, Mo5Si3, MoSi2, Ta5Si3, TaSi2, Nb5Si3