Chemical Vapor Deposition Diamond

タイトルまたは説明

CVD diamond is the chemical vapor deposition diamond (also named CVD diamond films). It is another significant revolution in synthetic diamond fields after the synthesis of diamond under high temperature and high pressure. Its size can be great, which is reaching **0mm diameter and 2 mm thickness in mass production at present. And the crystal quality can be compared with natural IIa diamond. At a low-pressure condition, the gases containing carbon such as CH4 and C3H8 will pyrolysis. Then will the effect of activation radical as H+ and OH, pure polycrystal diamond will be deposited on solid substrates. The main synthesis methods of CVD diamond films include: Hot-filament CVD, DC Arc Plasma Jet CVD, Microwave plasma CVD, DC hot cathode plasma CVD and the like. Among those, DC Arc Plasma Jet CVD has the performance of fast speed and good quality, which is very suitable for the production of tool-level diamond thick films.

CVD-Y****- premium type
It is used for the processing environments where extreme high abradability and heat dissipation is required.
CVD-K***-standard type
Suitable for the occasion use where high wear resistance is required.

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