Sputtering Target, Coating Materials From China New Metal Materials Technology Co., Ltd

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連絡先担当者 Wendy Wen

住所 Haidian, Beijing, Other

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製品: 10

High purity metal sputtering target material

Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im, Ag, Sn, Graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, iridium, Y, Ce, La, Yb, Gd, Pt, etc

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High purity Al, Cu, Ti, Si, Au, Ag

high purity Al, Cu, Ti, Si, Au, Ag, Im, Mg, Zn, Pt, Ge, Ni, Au-Ge Alloy, Au-Ni Alloy, Ni-Cr Alloy, Ti-Al Alloy, Cu-Im-Ga Alloy, Ci-Im-Ga-Se Alloy, Zn-

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High density ceramic sputtering target

ITO target, AZO target, IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3,

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NbF3, BaF2, CeF3, MgF2

fluoride: NbF3, BaF2, CeF3, MgF2, LaF3, YF3, YbF3, ErF3 etc.with high purity, no spilling, low deflation, well-distributed film, strong adhesion, bet

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High quality vacuum coating material

the vacuum coating materials produced by CNM boasts the following advantages: high purity, no spilling, low deflation, well-distributed film, strong a

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High purity alloy sputtering target

Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Al

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SiO, SiO2, TiO2, ZrO2, HfO2

SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. with high purity, no spilling, low deflation, well-distributed film, strong adhesion,

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Ni-V Alloy target, Ni-Cr target,

Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Al

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ZnS, ZnSe, TiN, SiC, LaTiO3

ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3, CdS etc. vacuum coating materials. with high purity, no spilling, low deflation, well-distributed

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