Helios New Materials Limited

Sapphire has high strength (Mohs hardness of 9), effectively prevent wear and scratches, can be used as window of medical equipment and optical system

Sapphire Wafer Application: Growth substrate for III-V and II-VI compounds Electronics and optoelectronics IR applications Silicon On Sapphire Integr

Sapphire wafer A-plane R-plane M-plane semipolar /nonpolar Specification: Material: >99.999% , High Purity, Al2O3 Orientation: A-axis(1120) 0.1 Orien

The aluminum nitride (AlN) ceramic has high thermal conductivity(5-10 times as the alumina ceramic), low dielectric constant and dissipation factor, g

Silicon wafer is the most common material and widely used for a varity of high-tech industries, including integrated circuits , detector or sensor dev

Helios provides high quality SiC wafer (Silicon Carbide) to electronic and optoelectronic industry . SiC wafer is a next generation semiconductor mate

PROPERTIES: Piezoelectric effect Anisotropy Double refraction APPLICATION: Quartz resonator Quartz crystal filter Quartz oscillator Polarizing prism

Fused silica glass JGS1, JGS2, JGS3 Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due